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A modeling study on the layout impact of with-in-die thickness range for STI CMP
(ECS, 2013)
Chemical Mechanical Planarization process has a proven track record as an effective method for planarizing the wafer surface at multiple points of the semiconductor manufacturing flow. One of the most challenging aspects ...
Analysis of near-field radiation transfer within nano-gaps using FDTD method
(Elsevier, 2014-10)
Enhancement of near-field radiative emission via coupling of surface plasmons in nano-gaps formed between thin films is important for understanding and implementation of energy harvesting using nano-thermophotovoltaic ...
Effect of commercial purity levels on the mechanical properties of ultrafine-grained titanium
(Elsevier, 2011-03-15)
Two grades of commercial purity (CP) titanium (grades 2 and 4) were processed using equal-channel angular extrusion (ECAE) at 300 ◦C and 450 ◦C, respectively. The processing temperatures were the minimum temperatures at ...
Tailoring silica nanotribology for CMP slurry optimization: Ca2+ cation competition in C12TAB mediated lubrication
(ACS, 2010-04-12)
Self-assembled surfactant structures at the solid/liquid interface have been shown to act as nanoparticulate dispersants and are capable of providing a highly effective, self-healing boundary lubrication layer in aqueous ...
Impact of pad conditioning on thickness profile control in chemical mechanical planarization
(Springer Science+Business Media, 2013-01)
Chemical mechanical planarization (CMP) has been proven to be the best method to achieve within-wafer and within-die uniformity for multilevel metallization. Decreasing device dimensions and increasing wafer sizes continuously ...
High temperature deformation behavior of 4340 steel: activation energy calculation and modeling of flow
(Elsevier, 2013-12)
The 4340 steel is extensively utilized in several industries including automotive and aerospace for manufacturing a large number of structural components. Due to the importance of thermo-mechanical processing in the ...
Polarization imaging of multiply-scattered radiation based on integral-vector Monte Carlo method
(Elsevier, 2010-01)
A new integral-vector Monte Carlo method (IVMCM) is developed to analyze the transfer of polarized radiation in 3D multiple scattering particle-laden media. The method is based on a “successive order of scattering series” ...
An investigation into momentum and temperature fields of a meso-scale slot synthetic jet for a small jet-to-surface spacing
(Begell House Inc., 2014)
Impinging synthetic jets have been identified as a promising technology for cooling miniature structures. Recognizing their thermal performance on the target surface requires a fundamental understanding of the momentum ...
Numerical and experimental analysis of impinging synthetic jets for cooling a point-like heat source
(ASME, 2018-05-01)
High power light emitting diodes (LEDs) being used for low and high beam in automotive lighting need active cooling of their heat sinks by radial or axial fans. But the moving elements of the fan cause abrasion, noise, and ...
Understanding selectivity on Germanium/SiO2 chemical mechanical planarization through design of experiments
(Cambridge University Press, 2015)
The continuous trend of achieving more complex microelectronics with smaller nodes yet larger wafer sizes in microelectronics manufacturing lead to aggressive development requirements for chemical mechanical planarization ...
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