Publication: Metal oxide nano film characterization for CMP optimization
| dc.contributor.author | Başım, Gül Bahar | |
| dc.contributor.author | Karagöz, Ayşe | |
| dc.contributor.author | Özdemir, Zeynep | |
| dc.contributor.department | Mechanical Engineering | |
| dc.contributor.ozuauthor | BAŞIM DOĞAN, Gül Bahar | |
| dc.contributor.ozugradstudent | Karagöz, Ayşe | |
| dc.contributor.ozugradstudent | Özdemir, Zeynep | |
| dc.date.accessioned | 2016-02-17T06:33:28Z | |
| dc.date.available | 2016-02-17T06:33:28Z | |
| dc.date.issued | 2013 | |
| dc.description | Due to copyright restrictions, the access to the full text of this article is only available via subscription. | |
| dc.description.abstract | This paper focuses on the planarization of metallic films in microelectronics manufacturing by CMP through investigation of metal oxide thin films forming as a result of the chemical component of the process. Tungsten planarization is discussed as a model to establish the role of metal oxide nano-films in achieving material removal through their formation characteristics during polishing. The findings indicate a protective oxide film formation on tungsten, which tends to nucleate at high concentrations of oxidizers and enables material removal through the interaction of nano-particles in the slurry with the surface oxide hillocks. | |
| dc.identifier.doi | 10.1149/05039.0003ecst | |
| dc.identifier.endpage | 7 | |
| dc.identifier.isbn | 978-1-60768-427-5 | |
| dc.identifier.issue | 39 | |
| dc.identifier.scopus | 2-s2.0-84885792534 | |
| dc.identifier.startpage | 3 | |
| dc.identifier.uri | http://hdl.handle.net/10679/2805 | |
| dc.identifier.uri | https://doi.org/10.1149/05039.0003ecst | |
| dc.identifier.volume | 50 | |
| dc.identifier.wos | 000338313100001 | |
| dc.language.iso | eng | en_US |
| dc.peerreviewed | yes | |
| dc.publicationstatus | published | en_US |
| dc.publisher | ECS | |
| dc.relation.ispartof | ECS Transactions - Chemical Mechanical Polishing 12 | |
| dc.relation.publicationcategory | International | |
| dc.rights | restrictedAccess | |
| dc.title | Metal oxide nano film characterization for CMP optimization | en_US |
| dc.type | conferenceObject | en_US |
| dspace.entity.type | Publication | |
| relation.isOrgUnitOfPublication | daa77406-1417-4308-b110-2625bf3b3dd7 | |
| relation.isOrgUnitOfPublication.latestForDiscovery | daa77406-1417-4308-b110-2625bf3b3dd7 |