Metal oxide thin film characterization for new generation chemical mechanical planarization development
dc.contributor.author | Başım, Gül Bahar | |
dc.contributor.author | Karagoz, Ayşe | |
dc.date.accessioned | 2017-07-25T08:19:28Z | |
dc.date.available | 2017-07-25T08:19:28Z | |
dc.date.issued | 2016 | |
dc.identifier.issn | 1938-5862 | en_US |
dc.identifier.uri | http://hdl.handle.net/10679/5467 | |
dc.identifier.uri | http://ecst.ecsdl.org/content/72/3/67.short | |
dc.description.abstract | This study targets to create a basis for the process development in the new generation semiconductor industry dealing with atomic scale devices. We focus on the CMP process development as it is used for the current and future semiconductor materials in microelectronics industry for metallic, semiconductor and dielectric materials. Particularly, formation and atomic level removal mechanisms of the CMP induced metal oxide thin films for metallic layers and chemically modified hydrated layer interaction for the semiconductor films are presented as a focus for the new generation device manufacturing. | en_US |
dc.language.iso | eng | en_US |
dc.publisher | The Electrochemical Society | en_US |
dc.relation.ispartof | ECS Transactions | en_US |
dc.rights | restrictedAccess | |
dc.title | Metal oxide thin film characterization for new generation chemical mechanical planarization development | en_US |
dc.type | Article | en_US |
dc.peerreviewed | yes | en_US |
dc.publicationstatus | published | en_US |
dc.contributor.department | Özyeğin University | |
dc.contributor.authorID | (ORCID 0000-0002-2049-4410 & YÖK ID 124618) Başım, Bahar | |
dc.contributor.ozuauthor | Başım, Gül Bahar | |
dc.identifier.doi | 10.1149/07203.0067ecst | en_US |
dc.subject.keywords | Characterization | en_US |
dc.subject.keywords | Chemical mechanical polishing | en_US |
dc.subject.keywords | Dielectric materials | en_US |
dc.subject.keywords | Metallic compounds | en_US |
dc.subject.keywords | Metals | en_US |
dc.subject.keywords | Microelectronics | en_US |
dc.subject.keywords | Oxide films | en_US |
dc.subject.keywords | Semiconductor device manufacture | en_US |
dc.subject.keywords | Semiconductor devices | en_US |
dc.subject.keywords | Semiconductor materials | en_US |
dc.identifier.scopus | SCOPUS:2-s2.0-85010896009 | |
dc.contributor.ozugradstudent | Karagoz, Ayşe | |
dc.contributor.authorFemale | 2 | |
dc.relation.publicationcategory | Article - International Refereed Journal - Institutional Academic Staff and PhD Student |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |
This item appears in the following Collection(s)
Share this page