Publication:
Improving selectivity on germanium CMP applications

dc.contributor.authorKaragöz, Ayşe
dc.contributor.authorBaşım, Gül Bahar
dc.contributor.departmentMechanical Engineering
dc.contributor.ozuauthorBAŞIM DOĞAN, Gül Bahar
dc.contributor.ozugradstudentKaragöz, Ayşe
dc.date.accessioned2016-02-17T06:33:28Z
dc.date.available2016-02-17T06:33:28Z
dc.date.issued2014
dc.descriptionDue to copyright restrictions, the access to the full text of this article is only available via subscription.
dc.description.abstractIn the presented paper, the adsorption characteristics of cationic and anionic surfactants on germanium and silica were studied in order to improve selectivity in germanium based shallow trench isolation chemical mechanical planarization applications. It was observed that the very strong or loose self-assembled surfactant structures can help obtain selectivity on the silica/germanium systems. Simultaneously, good defectivity control with a sufficient material removal rate was obtained. The surface charges manipulated by the surfactant adsorption and the hydrophobic nature of the germanium surface were main criteria on the selection of the proper surfactant/oxidizer system. In addition, impact of surfactant addition on particle-particle interactions controlling slurry stability was also investigated in the paper.
dc.description.sponsorshipEuropean Commission
dc.identifier.doi10.1149/06117.0037ecst
dc.identifier.endpage41
dc.identifier.issue17
dc.identifier.scopus2-s2.0-84925339915
dc.identifier.startpage37
dc.identifier.urihttp://hdl.handle.net/10679/2803
dc.identifier.urihttps://doi.org/10.1149/06117.0037ecst
dc.identifier.volume61
dc.identifier.wos000359709200005
dc.language.isoengen_US
dc.peerreviewedyes
dc.publicationstatuspublisheden_US
dc.publisherECS
dc.relationinfo:eu-repo/grantAgreement/EC/FP7/256348
dc.relation.ispartofECS Transactions
dc.relation.publicationcategoryInternational
dc.rightsrestrictedAccess
dc.titleImproving selectivity on germanium CMP applicationsen_US
dc.typeconferenceObjecten_US
dspace.entity.typePublication
relation.isOrgUnitOfPublicationdaa77406-1417-4308-b110-2625bf3b3dd7
relation.isOrgUnitOfPublication.latestForDiscoverydaa77406-1417-4308-b110-2625bf3b3dd7

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