Browsing by Subject "Microelectronics"
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Metal oxide thin film characterization for new generation chemical mechanical planarization development
(The Electrochemical Society, 2016)This study targets to create a basis for the process development in the new generation semiconductor industry dealing with atomic scale devices. We focus on the CMP process development as it is used for the current and ... -
A model of chemical mechanical planarization to predict impact of pad conditioning on process performance
(Cambridge University Press, 2012)This study presents an effort to couple a wafer removal rate profile model based on the locally relevant Preston equation to the change in pad thickness profile which reflects to post polish profile of the wafers after ...
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