Mechanical Engineering: Recent submissions
Now showing items 361-380 of 465
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Calibration of 2D ultrasound in 3D space for robotic biopsies
(IEEE, 2015)Freehand Ultrasound technique is widely used in intraoperative biopsy procedures for detecting the volumes of interest. Freehand ultrasound probe is faster and flexible with 6 degrees of freedom. Thats why the imaging ... -
Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces
(ECS, 2014)This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application ... -
A personal navigation system using mems-based high-density ground reaction sensor array and inertial measurement unit
(IEEE, 2015)This paper describes a prototype personal navigation system developed for position tracking under GPS denied environments by employing a commercial inertial measurement unit (IMU) and a MEMS-based ground reaction sensor ... -
Gabor filter based localization of needles in ultrasound guided robotic interventions
(IEEE, 2014)This paper presents an entropy based parameter tuning method for needle segmentation, and a probability map based needle tip estimation method using Gabor-based line filter. The proposed automatic parameter tuning method ... -
Environmental force estimation for a robotic hand : compliant contact detection
(IEEE, 2015)This paper presents a model based compensation method to enable environmental force estimation for a robotic hand with no tactile or force sensors. To this end, we utilize multi-joint robot dynamics and disturbance observer ... -
Study on the refrigerator bottom cabinet cavity acoustic behavior
(International Institute of Acoustics and Vibrations, 2014)Recently, sound comfort has become important in residential houses and noise emission is a distinctive feature for the selection of the home appliances in the same energy class. Refrigerators run continuously when it is ... -
Photocatalytic and antibacterial functionality evaluation of nanoboron coated textiles
(2016-09-01)Antibacterial properties of boron-containing compounds are well known although studies available on pure boron nanoparticles are relatively limited. In the present study, we examine the feasibility of the application of ... -
Understanding selectivity on Germanium/SiO2 chemical mechanical planarization through design of experiments
(Cambridge University Press, 2015)The continuous trend of achieving more complex microelectronics with smaller nodes yet larger wafer sizes in microelectronics manufacturing lead to aggressive development requirements for chemical mechanical planarization ... -
Studies on slurry design fundamentals for advanced CMP applications
(ECS, 2013)New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials is germanium which enables ... -
Surfactant mediated slurry formulations for Ge CMP applications
(Cambridge University Press, 2013)In this study, slurry formulations in the presence of self-assembled surfactant structures were investigated for Ge/SiO2 CMP applications in the absence and presence of oxidizers. Both anionic (sodium dodecyl sulfate-SDS) ... -
Metal CMP optimization based on chemically formed thin film analysis
(The Electrochemical Society, 2009)The conventional demands for development in semiconductor industry are changing as the Moore's Law is approaching to its limits. This paper demonstrates a theoretical optimization approach for the planarization of metal ... -
Improving selectivity on germanium CMP applications
(ECS, 2014)In the presented paper, the adsorption characteristics of cationic and anionic surfactants on germanium and silica were studied in order to improve selectivity in germanium based shallow trench isolation chemical mechanical ... -
Metal oxide nano film characterization for CMP optimization
(ECS, 2013)This paper focuses on the planarization of metallic films in microelectronics manufacturing by CMP through investigation of metal oxide thin films forming as a result of the chemical component of the process. Tungsten ... -
Evaluation of infection resistance of biological implants through CMP based micro-patterning
(Cambridge University Press, 2012-01)Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim ... -
Characterization of chemically modified thin films for optimization of metal CMP applications?
(Cambridge University Press, 2013)Metal CMP applications necessitate the formation of a protective oxide film in the presence of surface active agents, oxidizers, pH regulators and other chemicals to achieve global planarization. Formation and mechanical ... -
Chemical mechanical planarization studies on gallium nitride for improved performance
(IEEE, 2015)In this study, a systematic experimental approach has been followed to determine the conditions to promote material removal rate while controlling surface defectivity for GaN CMP. Silica based slurries were used to optimize ... -
Chemical mechanical polishing implementation on dental implants
(IEEE, 2015)In this study, chemical mechanical polishing (CMP) technique is introduced as a new alternative to generate controlled nano/micro scale roughness on the titanium implant surfaces. It is known that micro scale patterns ... -
A modeling study on the layout impact of with-in-die thickness range for STI CMP
(ECS, 2013)Chemical Mechanical Planarization process has a proven track record as an effective method for planarizing the wafer surface at multiple points of the semiconductor manufacturing flow. One of the most challenging aspects ... -
An active brace for controlled transdermal drug delivery for adjustable physical therapy
(IEEE, 2014)This study presents an active brace which is a cost efficient precision-controlled advanced therapy medicinal product for time and rate controlled transdermal drug delivery (TDD) through the use of drug containing nanoparticles ... -
Advanced slurry formulations for new generation chemical mechanical planarization (CMP) applications
(Cambridge University Press, 2012-01)Chemical Mechanical Planarization (CMP) is widely used to ensure planarity of metal and dielectric surfaces to enable photolithography and hence multilevel metallization in microelectronics manufacturing. The aim of this ...
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