Search
Now showing items 1-2 of 2
A fundamental approach to electrochemical analyses on chemically modified thin films for barrier CMP optimization
(IOP Publishing, 2019-04-09)
Chemical Mechanical Planarization (CMP) process development for 10nm nodes and beyond demands a systematic understanding of atomic-scale chemical and mechanical surface interactions for the control of material removal, ...
Surface characterization of textiles for optimization of functional polymeric nano-capsule attachment
(Carl Hanser Verlag, 2019-09)
Surface properties of textiles play an essential role in their functionalization with micro/nanometer-sized polymeric capsules containing active agents that can provide controlled release. The attached capsules provide ...
Share this page