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Chemical mechanical planarization studies on gallium nitride for improved performance
Karagöz, Ayşe; Başım, Gül Bahar; Siebert, M.; Leunissen, L. A. H. (IEEE, 2015)In this study, a systematic experimental approach has been followed to determine the conditions to promote material removal rate while controlling surface defectivity for GaN CMP. Silica based slurries were used to optimize ... -
Surface characterization driven CMP optimization for gallium nitride
Karagoz, Ayşe; Siebert, M.; Leunissen, P.; Başım, Gül Bahar (ECS, 2016)Gallium nitride is a hard and chemically inert material demoting high material removal rates in the chemical mechanical planarization (CMP) applications. This paper focuses on the optimization of the process conditions to ...
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