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dc.contributor.authorBaşım, Gül Bahar
dc.contributor.authorKaragöz, Ayşe
dc.contributor.authorÖzdemir, Zeynep
dc.contributor.authorVakarelski, I. U.
dc.contributor.authorChen, L.
dc.date.accessioned2016-02-17T06:33:29Z
dc.date.available2016-02-17T06:33:29Z
dc.date.issued2013
dc.identifier.isbn978-1-60768-427-5
dc.identifier.urihttp://hdl.handle.net/10679/2812
dc.identifier.urihttp://ecst.ecsdl.org/content/50/39/29.abstract
dc.descriptionDue to copyright restrictions, the access to the full text of this article is only available via subscription.
dc.description.abstractNew developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials is germanium which enables improved performance through better channel mobility in shallow trench isolation (STI) applications. This paper reports on the slurry design alternatives for Ge CMP with surfactant mediation to improve on the silica/germanium selectivity using colloidal silica slurry. In addition to the standard CMP tests to evaluate the material removal rates, atomic force microscopy (AFM) based wear tests were also conducted to evaluate single particle-surface interaction of the polishing system. Furthermore, nature of the surface oxide film of germanium was studied through contact angle measurements and surface roughness tested by AFM. It was observed that the CMP selectivity of the silica/germanium system and defectivity control were possible with a reasonable material removal rate value by using self-assembled structures of cationic surfactants.
dc.language.isoengen_US
dc.publisherECS
dc.relation.ispartofECS Transactions - Chemical Mechanical Polishing 12
dc.rightsrestrictedAccess
dc.titleStudies on slurry design fundamentals for advanced CMP applicationsen_US
dc.typeConference paperen_US
dc.peerreviewedyes
dc.publicationstatuspublisheden_US
dc.contributor.departmentÖzyeğin University
dc.contributor.authorID(ORCID 0000-0002-2049-4410 & YÖK ID 124618) Başım, Bahar
dc.contributor.ozuauthorBaşım, Gül Bahar
dc.identifier.volume50
dc.identifier.issue39
dc.identifier.startpage29
dc.identifier.endpage33
dc.identifier.wosWOS:000338313100004
dc.identifier.doi10.1149/05039.0029ecst
dc.identifier.scopusSCOPUS:2-s2.0-84885825640
dc.contributor.ozugradstudentKaragöz, Ayşe
dc.contributor.ozugradstudentÖzdemir, Zeynep
dc.contributor.authorFemale3
dc.relation.publicationcategoryConference Paper - International - Institutional Academic Staff and PhD Student


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