Search
Now showing items 21-30 of 31
Evaluation of infection resistance of biological implants through CMP based micro-patterning
(Cambridge University Press, 2012-01)
Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim ...
Characterization of nano-scale protective oxide films: application on metal chemical mechanical planarization
(The Electrochemical Society, 2015)
This study focuses on the characterization of nano-scale metal oxide films for chemical mechanical planarization (CMP) applications. The protective nature of the self-grown metal oxide layers in the CMP slurry environment ...
Self-cleaning ability quantization of textiles with degussa P-25
(Trans Tech Publications Inc., 2018)
This study proposes a systematic quantification of effectiveness of the Degussa P-25 titania particles used as a benchmark in photocatalytic applications to standardize ability of self-cleaning textile applications and to ...
Effect of chemical mechanical polishing on surface nature of titanium implants FT-IR and wettability data of titanium implants surface after chemical mechanical polishing implementation
(Elsevier, 2017)
Bioactivity of titanium depends on the quality and characteristics of its surface oxide film. Through implementation of chemical mechanical polishing (CMP) process on titanium plates, a protective oxide (titania) film grows ...
Application of chemical mechanical polishing process on titanium based implants
(Elsevier, 2016-11-01)
Modification of the implantable biomaterial surfaces is known to improve the biocompatibility of metallic implants. Particularly, treatments such as etching, sand-blasting or laser treatment are commonly studied to understand ...
Metal oxide thin film characterization for new generation chemical mechanical planarization development
(The Electrochemical Society, 2016)
This study targets to create a basis for the process development in the new generation semiconductor industry dealing with atomic scale devices. We focus on the CMP process development as it is used for the current and ...
Surface characterization of textiles for optimization of functional polymeric nano-capsule attachment
(Carl Hanser Verlag, 2019-09)
Surface properties of textiles play an essential role in their functionalization with micro/nanometer-sized polymeric capsules containing active agents that can provide controlled release. The attached capsules provide ...
Nano-boron as an antibacterial agent for functionalized textiles
(Cambridge University Press, 2015-01)
The antibacterial properties of boron-containing compounds are well known although there are limited studies available on the pure boron nanoparticles. In this study boron nano-particles were characterized in terms of their ...
3-D extension of chemical mechanical polishing for nano-structuring applications on alternative technologies
(The Electrochemical Society, 2016)
In this study we tune the chemical mechanical polishing process to a 3-D level to generate controlled nanostructures on functional metallic surfaces such as titanium implants and steel based heating elements. The chemical ...
A model of chemical mechanical planarization to predict impact of pad conditioning on process performance
(Cambridge University Press, 2012)
This study presents an effort to couple a wafer removal rate profile model based on the locally relevant Preston equation to the change in pad thickness profile which reflects to post polish profile of the wafers after ...
Share this page