Search
Now showing items 1-2 of 2
Controlling germanium CMP selectivity through slurry mediation by surface active agents
(The Electrochemical Society, 2015-08-10)
New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials to semiconductor manufacturing ...
The photocatalytic effects of textile materials treated with TiO2 and Fe/TiO2
(Institutul Naţional de Cercetare-Dezvoltare pentru Textile şi Pielărie, 2015)
The research has been focused on the photocatalytic activity of the textile materials treated with TiO2 and TiO2 iron doped by pad-dry-cure and cationization - pad-dry-cure. The fabrics have been exposed to UV and visible ...
Share this page