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Understanding selectivity on Germanium/SiO2 chemical mechanical planarization through design of experiments
(Cambridge University Press, 2015)
The continuous trend of achieving more complex microelectronics with smaller nodes yet larger wafer sizes in microelectronics manufacturing lead to aggressive development requirements for chemical mechanical planarization ...
Surfactant mediated slurry formulations for Ge CMP applications
(Cambridge University Press, 2013)
In this study, slurry formulations in the presence of self-assembled surfactant structures were investigated for Ge/SiO2 CMP applications in the absence and presence of oxidizers. Both anionic (sodium dodecyl sulfate-SDS) ...
Advanced slurry formulations for new generation chemical mechanical planarization (CMP) applications
(Cambridge University Press, 2012-01)
Chemical Mechanical Planarization (CMP) is widely used to ensure planarity of metal and dielectric surfaces to enable photolithography and hence multilevel metallization in microelectronics manufacturing. The aim of this ...
Evaluation of infection resistance of biological implants through CMP based micro-patterning
(Cambridge University Press, 2012-01)
Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim ...
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