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Studies on slurry design fundamentals for advanced CMP applications
(ECS, 2013)
New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials is germanium which enables ...
Metal oxide nano film characterization for CMP optimization
(ECS, 2013)
This paper focuses on the planarization of metallic films in microelectronics manufacturing by CMP through investigation of metal oxide thin films forming as a result of the chemical component of the process. Tungsten ...
Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces
(ECS, 2014)
This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application ...
Advanced slurry formulations for new generation chemical mechanical planarization (CMP) applications
(Cambridge University Press, 2012-01)
Chemical Mechanical Planarization (CMP) is widely used to ensure planarity of metal and dielectric surfaces to enable photolithography and hence multilevel metallization in microelectronics manufacturing. The aim of this ...
Characterization of chemically modified thin films for optimization of metal CMP applications?
(Cambridge University Press, 2013)
Metal CMP applications necessitate the formation of a protective oxide film in the presence of surface active agents, oxidizers, pH regulators and other chemicals to achieve global planarization. Formation and mechanical ...
Biomaterials applications of chemical mechanical polishing
(IEEE, 2012)
Chemical Mechanical Polishing (CMP) is used in semiconductor industry to enable planarization of the interlayer dielectrics and metals. In this study, CMP is used as a polishing technique to modify the surface roughness ...
Chemical mechanical polishing implementation on dental implants
(IEEE, 2015)
In this study, chemical mechanical polishing (CMP) technique is introduced as a new alternative to generate controlled nano/micro scale roughness on the titanium implant surfaces. It is known that micro scale patterns ...
Evaluation of infection resistance of biological implants through CMP based micro-patterning
(Cambridge University Press, 2012-01)
Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim ...
Effect of chemical mechanical polishing on surface nature of titanium implants FT-IR and wettability data of titanium implants surface after chemical mechanical polishing implementation
(Elsevier, 2017)
Bioactivity of titanium depends on the quality and characteristics of its surface oxide film. Through implementation of chemical mechanical polishing (CMP) process on titanium plates, a protective oxide (titania) film grows ...
Application of chemical mechanical polishing process on titanium based implants
(Elsevier, 2016-11-01)
Modification of the implantable biomaterial surfaces is known to improve the biocompatibility of metallic implants. Particularly, treatments such as etching, sand-blasting or laser treatment are commonly studied to understand ...
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