Browsing by Subject "Chemical mechanical planarization"
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Controlling germanium CMP selectivity through slurry mediation by surface active agents
(The Electrochemical Society, 2015-08-10)New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials to semiconductor manufacturing ... -
Nano-scale chemically modified thin film characterization for chemical mechanical planarization applications
(2015-01)The aim of the microelectronics industry has historically been achieving increasing functionality through decreasing the device sizes while simultaneously reducing the unit manufacturing costs. This objective has been ...
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