Browsing Mechanical Engineering by Author "(ORCID 0000-0002-2049-4410 & YÖK ID 124618) Başım, Bahar"
Now showing items 1-20 of 37
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3-D extension of chemical mechanical polishing for nano-structuring applications on alternative technologies
Özdemir, Zeynep; Başım, Gül Bahar (The Electrochemical Society, 2016)In this study we tune the chemical mechanical polishing process to a 3-D level to generate controlled nanostructures on functional metallic surfaces such as titanium implants and steel based heating elements. The chemical ... -
An active brace for controlled transdermal drug delivery for adjustable physical therapy
Erol, Levent; Bebek, Özkan; Karagöz, Ayşe; Başım, Gül Bahar (IEEE, 2014)This study presents an active brace which is a cost efficient precision-controlled advanced therapy medicinal product for time and rate controlled transdermal drug delivery (TDD) through the use of drug containing nanoparticles ... -
Advanced slurry formulations for new generation chemical mechanical planarization (CMP) applications
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (Cambridge University Press, 2012-01)Chemical Mechanical Planarization (CMP) is widely used to ensure planarity of metal and dielectric surfaces to enable photolithography and hence multilevel metallization in microelectronics manufacturing. The aim of this ... -
Application of chemical mechanical polishing process on titanium based implants
Özdemir, Zeynep; Ozdemir, A.; Başım, Gül Bahar (Elsevier, 2016-11-01)Modification of the implantable biomaterial surfaces is known to improve the biocompatibility of metallic implants. Particularly, treatments such as etching, sand-blasting or laser treatment are commonly studied to understand ... -
Biomaterials applications of chemical mechanical polishing
Başım, Gül Bahar; Özdemir, Zeynep; Mutlu, Ö. (IEEE, 2012)Chemical Mechanical Polishing (CMP) is used in semiconductor industry to enable planarization of the interlayer dielectrics and metals. In this study, CMP is used as a polishing technique to modify the surface roughness ... -
A Cahn-Hilliard modeling of metal oxide thin films for advanced CMP applications
Karagöz, Ayşe; Şengül, Yasemin; Başım, Gül Bahar (ECS, 2014)Chemical mechanical planarization (CMP) process enables topographic selectivity through formation of a protective oxide thin film on the recessed locations of the deposited metal layer, while a continuous chemical oxidation ... -
Characterization and antibacterial properties of nanoboron powders and nanoboron powder coated textiles
Akbar, Wazir; Noor, M. R.; Kowal, K.; Syed, T.; Soulimane, T.; Başım, Gül Bahar (Elsevier, 2017-02)The antibacterial properties of boron-containing compounds are well known although there are limited studies available on the pure boron nanoparticles. In this paper, nanoboron particles are characterized in terms of their ... -
Characterization of chemically modified thin films for optimization of metal CMP applications?
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (Cambridge University Press, 2013)Metal CMP applications necessitate the formation of a protective oxide film in the presence of surface active agents, oxidizers, pH regulators and other chemicals to achieve global planarization. Formation and mechanical ... -
Characterization of nano-scale protective oxide films: application on metal chemical mechanical planarization
Karagöz, Ayse; Craciun, V.; Başım, Gül Bahar (The Electrochemical Society, 2015)This study focuses on the characterization of nano-scale metal oxide films for chemical mechanical planarization (CMP) applications. The protective nature of the self-grown metal oxide layers in the CMP slurry environment ... -
Chemical mechanical planarization studies on gallium nitride for improved performance
Karagöz, Ayşe; Başım, Gül Bahar; Siebert, M.; Leunissen, L. A. H. (IEEE, 2015)In this study, a systematic experimental approach has been followed to determine the conditions to promote material removal rate while controlling surface defectivity for GaN CMP. Silica based slurries were used to optimize ... -
Chemical mechanical polishing implementation on dental implants
Başım, Gül Bahar; Özdemir, Zeynep (IEEE, 2015)In this study, chemical mechanical polishing (CMP) technique is introduced as a new alternative to generate controlled nano/micro scale roughness on the titanium implant surfaces. It is known that micro scale patterns ... -
Controlling germanium CMP selectivity through slurry mediation by surface active agents
Karagöz, Ayşe; Başım, Gül Bahar (The Electrochemical Society, 2015-08-10)New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials to semiconductor manufacturing ... -
Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces
Özdemir, Zeynep; Orhan, Orçun; Bebek, Özkan; Başım, Gül Bahar (ECS, 2014)This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application ... -
Effect of chemical mechanical polishing on surface nature of titanium implants FT-IR and wettability data of titanium implants surface after chemical mechanical polishing implementation
Özdemir, Zeynep; Başım, Gül Bahar (Elsevier, 2017)Bioactivity of titanium depends on the quality and characteristics of its surface oxide film. Through implementation of chemical mechanical polishing (CMP) process on titanium plates, a protective oxide (titania) film grows ... -
Effect of different surface treatments on retention of cement-retained, implant-supported crowns
Ozyetim, E. B.; Özdemir, Zeynep; Başım, Gül Bahar; Bayraktar, G. (Quintessence Publishing Co. Inc., 2023)To evaluate the effect of different treatments applied to titanium implant abutment surfaces on the retention of implant-supported crowns retained using resin cement. Materials and Methods: A total of 72 titanium implant ... -
Effect of slurry aging on stability and performance of chemical mechanical planarization process
Başım, Gül Bahar (Elsevier, 2011-03)Chemical mechanical planarization (CMP) is known to be one of the most challenging processes in microelectronics manufacturing due to the number of variables involved in the design of the process. In particular, the slurries ... -
Evaluation of infection resistance of biological implants through CMP based micro-patterning
Başım, Gül Bahar; Özdemir, Zeynep; Karagöz, Ayşe (Cambridge University Press, 2012-01)Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim ... -
A fundamental approach to electrochemical analyses on chemically modified thin films for barrier CMP optimization
Yagan, Rawana; Başım, Gül Bahar (IOP Publishing, 2019-04-09)Chemical Mechanical Planarization (CMP) process development for 10nm nodes and beyond demands a systematic understanding of atomic-scale chemical and mechanical surface interactions for the control of material removal, ... -
Impact of pad conditioning on thickness profile control in chemical mechanical planarization
Kincal, S.; Başım, Gül Bahar (Springer Science+Business Media, 2013-01)Chemical mechanical planarization (CMP) has been proven to be the best method to achieve within-wafer and within-die uniformity for multilevel metallization. Decreasing device dimensions and increasing wafer sizes continuously ... -
Improving selectivity on germanium CMP applications
Karagöz, Ayşe; Başım, Gül Bahar (ECS, 2014)In the presented paper, the adsorption characteristics of cationic and anionic surfactants on germanium and silica were studied in order to improve selectivity in germanium based shallow trench isolation chemical mechanical ...
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