Chemical mechanical polishing implementation on dental implants

Abstract

In this study, chemical mechanical polishing (CMP) technique is introduced as a new alternative to generate controlled nano/micro scale roughness on the titanium implant surfaces. It is known that micro scale patterns induced on biomaterial surfaces promote bio-compatibility by increasing the capability of cell attachment. However, current developments on biomaterials highlight the impact of nano-scale roughness in promoting the biocompatibility on the metallic implant surfaces. CMP process brings the advantage of inducing smoothness or controlled nano-structures on the bio-implant material surfaces. Here, we focus particularly on the dental implant applications to change the surface roughness and the resulting bioactivity in a controlled manner.