Browsing by Author "Siebert, M."

Now showing items 1-2 of 2

Chemical mechanical planarization studies on gallium nitride for improved performance

Karagöz, Ayşe; Başım, Gül Bahar; Siebert, M.; Leunissen, L. A. H. (IEEE, 2015)

In this study, a systematic experimental approach has been followed to determine the conditions to promote material removal rate while controlling surface defectivity for GaN CMP. Silica based slurries were used to optimize ...
Surface characterization driven CMP optimization for gallium nitride

Karagoz, Ayşe; Siebert, M.; Leunissen, P.; Başım, Gül Bahar (ECS, 2016)

Gallium nitride is a hard and chemically inert material demoting high material removal rates in the chemical mechanical planarization (CMP) applications. This paper focuses on the optimization of the process conditions to ...

Share this page