Browsing by Author "Başım, Gül Bahar"
Now showing items 1-20 of 42
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3-D extension of chemical mechanical polishing for nano-structuring applications on alternative technologies
Özdemir, Zeynep; Başım, Gül Bahar (The Electrochemical Society, 2016)In this study we tune the chemical mechanical polishing process to a 3-D level to generate controlled nanostructures on functional metallic surfaces such as titanium implants and steel based heating elements. The chemical ... -
An active brace for controlled transdermal drug delivery for adjustable physical therapy
Erol, Levent; Bebek, Özkan; Karagöz, Ayşe; Başım, Gül Bahar (IEEE, 2014)This study presents an active brace which is a cost efficient precision-controlled advanced therapy medicinal product for time and rate controlled transdermal drug delivery (TDD) through the use of drug containing nanoparticles ... -
Advanced slurry formulations for new generation chemical mechanical planarization (CMP) applications
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (Cambridge University Press, 2012-01)Chemical Mechanical Planarization (CMP) is widely used to ensure planarity of metal and dielectric surfaces to enable photolithography and hence multilevel metallization in microelectronics manufacturing. The aim of this ... -
Application of chemical mechanical polishing process on titanium based implants
Özdemir, Zeynep; Ozdemir, A.; Başım, Gül Bahar (Elsevier, 2016-11-01)Modification of the implantable biomaterial surfaces is known to improve the biocompatibility of metallic implants. Particularly, treatments such as etching, sand-blasting or laser treatment are commonly studied to understand ... -
Application of chemical mechanical polishing process on titanium based medical implants
Özdemir, Zeynep (2017-05)Biomaterials are commonly used as implant materials in the body for dental prostheses, orthopedic applications, heart valves and catheters. Based on the research studies conducted up to date, titanium and its alloys are ... -
Biomaterials applications of chemical mechanical polishing
Başım, Gül Bahar; Özdemir, Zeynep; Mutlu, Ö. (IEEE, 2012)Chemical Mechanical Polishing (CMP) is used in semiconductor industry to enable planarization of the interlayer dielectrics and metals. In this study, CMP is used as a polishing technique to modify the surface roughness ... -
A Cahn-Hilliard modeling of metal oxide thin films for advanced CMP applications
Karagöz, Ayşe; Şengül, Yasemin; Başım, Gül Bahar (ECS, 2014)Chemical mechanical planarization (CMP) process enables topographic selectivity through formation of a protective oxide thin film on the recessed locations of the deposited metal layer, while a continuous chemical oxidation ... -
Characterization and antibacterial properties of nanoboron powders and nanoboron powder coated textiles
Akbar, Wazir; Noor, M. R.; Kowal, K.; Syed, T.; Soulimane, T.; Başım, Gül Bahar (Elsevier, 2017-02)The antibacterial properties of boron-containing compounds are well known although there are limited studies available on the pure boron nanoparticles. In this paper, nanoboron particles are characterized in terms of their ... -
Characterization of chemically modified thin films for optimization of metal CMP applications?
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (Cambridge University Press, 2013)Metal CMP applications necessitate the formation of a protective oxide film in the presence of surface active agents, oxidizers, pH regulators and other chemicals to achieve global planarization. Formation and mechanical ... -
Characterization of nano-scale protective oxide films: application on metal chemical mechanical planarization
Karagöz, Ayse; Craciun, V.; Başım, Gül Bahar (The Electrochemical Society, 2015)This study focuses on the characterization of nano-scale metal oxide films for chemical mechanical planarization (CMP) applications. The protective nature of the self-grown metal oxide layers in the CMP slurry environment ... -
Chemical mechanical planarization studies on gallium nitride for improved performance
Karagöz, Ayşe; Başım, Gül Bahar; Siebert, M.; Leunissen, L. A. H. (IEEE, 2015)In this study, a systematic experimental approach has been followed to determine the conditions to promote material removal rate while controlling surface defectivity for GaN CMP. Silica based slurries were used to optimize ... -
Chemical mechanical polishing implementation on dental implants
Başım, Gül Bahar; Özdemir, Zeynep (IEEE, 2015)In this study, chemical mechanical polishing (CMP) technique is introduced as a new alternative to generate controlled nano/micro scale roughness on the titanium implant surfaces. It is known that micro scale patterns ... -
Controlling germanium CMP selectivity through slurry mediation by surface active agents
Karagöz, Ayşe; Başım, Gül Bahar (The Electrochemical Society, 2015-08-10)New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials to semiconductor manufacturing ... -
Development of 3-D chemical mechanical polishing process for nanostructuring of bioimplant surfaces
Özdemir, Zeynep; Orhan, Orçun; Bebek, Özkan; Başım, Gül Bahar (ECS, 2014)This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application ... -
Development of multifunctional tick repellent textiles
Akbar, Wazir (2016-09)This thesis focuses on smart textile manufacturing with tick repellency through encapsulation of the natural extracts and applying them onto the fabric surfaces. Tick-borne encephalitis (TBE) is a human viral infectious ... -
Development of nano structured photo-catalytic textile materials
Cerhan, Asena (2017-07)This study focuses on assisting problems which have delayed the commercialization of the photocatalytic textile applications by the following innovative technological developments related to photocatalytic compounds; (i) ... -
Effect of chemical mechanical polishing on surface nature of titanium implants FT-IR and wettability data of titanium implants surface after chemical mechanical polishing implementation
Özdemir, Zeynep; Başım, Gül Bahar (Elsevier, 2017)Bioactivity of titanium depends on the quality and characteristics of its surface oxide film. Through implementation of chemical mechanical polishing (CMP) process on titanium plates, a protective oxide (titania) film grows ... -
Effect of slurry aging on stability and performance of chemical mechanical planarization process
Başım, Gül Bahar (Elsevier, 2011-03)Chemical mechanical planarization (CMP) is known to be one of the most challenging processes in microelectronics manufacturing due to the number of variables involved in the design of the process. In particular, the slurries ... -
Electrochemical evaluations of TiO2 nano films for advanced engineering applications
Yagan, Rawana (2018-05)This study evaluates the performance TiO2 nano-film for engineering applications, both in biomedicine and microelectronics, were Chemical Mechanical Planarization (CMP) is a main process used for planarizing the metal ... -
Evaluation of infection resistance of biological implants through CMP based micro-patterning
Başım, Gül Bahar; Özdemir, Zeynep; Karagöz, Ayşe (Cambridge University Press, 2012-01)Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim ...
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