Browsing by Author "Vakarelski, I. U."
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Studies on slurry design fundamentals for advanced CMP applications
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep; Vakarelski, I. U.; Chen, L. (ECS, 2013)New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials is germanium which enables ... -
Tailoring silica nanotribology for CMP slurry optimization: Ca2+ cation competition in C12TAB mediated lubrication
Vakarelski, I. U.; Brown, S. C.; Başım, Gül Bahar; Rabinovich, Y. I.; Moudgil, B. M. (ACS, 2010-04-12)Self-assembled surfactant structures at the solid/liquid interface have been shown to act as nanoparticulate dispersants and are capable of providing a highly effective, self-healing boundary lubrication layer in aqueous ...
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