Özdemir, ZeynepOrhan, OrçunBebek, ÖzkanBaşım, Gül Bahar2016-02-172016-02-1720141938-5862http://hdl.handle.net/10679/2851https://doi.org/10.1149/06117.0021ecstDue to copyright restrictions, the access to the full text of this article is only available via subscription.This study focuses on the development of a three dimensional chemical mechanical polishing (CMP) process to induce smoothness or controlled nano-roughness on the bio-implant material surfaces, particularly for an application on the dental implants. CMP helps produce implant surfaces that are cleaned from potentially contaminated surface layers by removing a nano-scale top layer while simultaneously creating a protective oxide film on the surface to limit any further contamination to minimize risk of infection. Hence, we propose CMP as a synergistic method of nano-structuring on the implant surfaces and focus on extending the process to a 3-D platform to implement it on the dental implants.engrestrictedAccessconferenceObject6117212600035970920000310.1149/06117.0021ecst2-s2.0-84925298128