Surface characterization driven CMP optimization for gallium nitride
dc.contributor.author | Karagoz, Ayşe | |
dc.contributor.author | Siebert, M. | |
dc.contributor.author | Leunissen, P. | |
dc.contributor.author | Başım, Gül Bahar | |
dc.date.accessioned | 2017-07-26T12:09:19Z | |
dc.date.available | 2017-07-26T12:09:19Z | |
dc.date.issued | 2016 | |
dc.identifier.issn | 1938-5862 | en_US |
dc.identifier.uri | http://hdl.handle.net/10679/5485 | |
dc.identifier.uri | http://ecst.ecsdl.org/content/72/18/55.abstract | |
dc.description.abstract | Gallium nitride is a hard and chemically inert material demoting high material removal rates in the chemical mechanical planarization (CMP) applications. This paper focuses on the optimization of the process conditions to enhance material removal rates while controlling surface defectivity for GaN CMP. Two different crystallographic orientations of the GaN are characterized and compared to a commercial 2” GaN wafer to optimize the CMP performance on the basis of the wafer crystallographic nature, surface charge and topography. Slurry pH, the type of polishing pad and applied conditioning were evaluated to increase material removal rates of GaN while minimizing defect formation and enhancing the selectivity against silica. | en_US |
dc.language.iso | eng | en_US |
dc.publisher | ECS | en_US |
dc.relation.ispartof | ECS Transactions | en_US |
dc.rights | restrictedAccess | |
dc.title | Surface characterization driven CMP optimization for gallium nitride | en_US |
dc.type | Conference paper | en_US |
dc.peerreviewed | yes | |
dc.publicationstatus | published | en_US |
dc.contributor.department | Özyeğin University | |
dc.contributor.authorID | (ORCID 0000-0002-2049-4410 & YÖK ID 124618) Başım, Bahar | |
dc.contributor.ozuauthor | Başım, Gül Bahar | |
dc.identifier.volume | 72 | en_US |
dc.identifier.issue | 18 | en_US |
dc.identifier.startpage | 55 | en_US |
dc.identifier.endpage | 59 | en_US |
dc.identifier.doi | 10.1149/07218.0055ecst | en_US |
dc.subject.keywords | Chemical mechanical polishing | en_US |
dc.identifier.scopus | SCOPUS:2-s2.0-85019765601 | |
dc.contributor.ozugradstudent | Karagoz, Ayşe | |
dc.contributor.authorFemale | 2 | |
dc.relation.publicationcategory | Conference Paper - Institutional Academic Staff and PhD Student |
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