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Biomaterials applications of chemical mechanical polishing
(IEEE, 2012)
Chemical Mechanical Polishing (CMP) is used in semiconductor industry to enable planarization of the interlayer dielectrics and metals. In this study, CMP is used as a polishing technique to modify the surface roughness ...
Chemical mechanical planarization studies on gallium nitride for improved performance
(IEEE, 2015)
In this study, a systematic experimental approach has been followed to determine the conditions to promote material removal rate while controlling surface defectivity for GaN CMP. Silica based slurries were used to optimize ...
Chemical mechanical polishing implementation on dental implants
(IEEE, 2015)
In this study, chemical mechanical polishing (CMP) technique is introduced as a new alternative to generate controlled nano/micro scale roughness on the titanium implant surfaces. It is known that micro scale patterns ...
Evaluation of infection resistance of biological implants through CMP based micro-patterning
(Cambridge University Press, 2012-01)
Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim ...
A fundamental approach to electrochemical analyses on chemically modified thin films for barrier CMP optimization
(IOP Publishing, 2019-04-09)
Chemical Mechanical Planarization (CMP) process development for 10nm nodes and beyond demands a systematic understanding of atomic-scale chemical and mechanical surface interactions for the control of material removal, ...
Characterization of nano-scale protective oxide films: application on metal chemical mechanical planarization
(The Electrochemical Society, 2015)
This study focuses on the characterization of nano-scale metal oxide films for chemical mechanical planarization (CMP) applications. The protective nature of the self-grown metal oxide layers in the CMP slurry environment ...
Self-cleaning ability quantization of textiles with degussa P-25
(Trans Tech Publications Inc., 2018)
This study proposes a systematic quantification of effectiveness of the Degussa P-25 titania particles used as a benchmark in photocatalytic applications to standardize ability of self-cleaning textile applications and to ...
Effect of chemical mechanical polishing on surface nature of titanium implants FT-IR and wettability data of titanium implants surface after chemical mechanical polishing implementation
(Elsevier, 2017)
Bioactivity of titanium depends on the quality and characteristics of its surface oxide film. Through implementation of chemical mechanical polishing (CMP) process on titanium plates, a protective oxide (titania) film grows ...
The photocatalytic effects of textile materials treated with TiO2 and Fe/TiO2
(Institutul Naţional de Cercetare-Dezvoltare pentru Textile şi Pielărie, 2015)
The research has been focused on the photocatalytic activity of the textile materials treated with TiO2 and TiO2 iron doped by pad-dry-cure and cationization - pad-dry-cure. The fabrics have been exposed to UV and visible ...
Application of chemical mechanical polishing process on titanium based implants
(Elsevier, 2016-11-01)
Modification of the implantable biomaterial surfaces is known to improve the biocompatibility of metallic implants. Particularly, treatments such as etching, sand-blasting or laser treatment are commonly studied to understand ...
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