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Characterization of chemically modified thin films for optimization of metal CMP applications?

Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (Cambridge University Press, 2013)

Metal CMP applications necessitate the formation of a protective oxide film in the presence of surface active agents, oxidizers, pH regulators and other chemicals to achieve global planarization. Formation and mechanical ...

Studies on slurry design fundamentals for advanced CMP applications

Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep; Vakarelski, I. U.; Chen, L. (ECS, 2013)

New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials is germanium which enables ...

Surfactant mediated slurry formulations for Ge CMP applications

Başım, Gül Bahar; Karagöz, Ayşe; Chen, L.; Vakarelski, I. (Cambridge University Press, 2013)

In this study, slurry formulations in the presence of self-assembled surfactant structures were investigated for Ge/SiO2 CMP applications in the absence and presence of oxidizers. Both anionic (sodium dodecyl sulfate-SDS) ...

Metal oxide nano film characterization for CMP optimization

Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (ECS, 2013)

This paper focuses on the planarization of metallic films in microelectronics manufacturing by CMP through investigation of metal oxide thin films forming as a result of the chemical component of the process. Tungsten ...