Browsing by Author "Karagöz, Ayşe"
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An active brace for controlled transdermal drug delivery for adjustable physical therapy
Erol, Levent; Bebek, Özkan; Karagöz, Ayşe; Başım, Gül Bahar (IEEE, 2014)This study presents an active brace which is a cost efficient precision-controlled advanced therapy medicinal product for time and rate controlled transdermal drug delivery (TDD) through the use of drug containing nanoparticles ... -
Advanced slurry formulations for new generation chemical mechanical planarization (CMP) applications
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (Cambridge University Press, 2012-01)Chemical Mechanical Planarization (CMP) is widely used to ensure planarity of metal and dielectric surfaces to enable photolithography and hence multilevel metallization in microelectronics manufacturing. The aim of this ... -
A Cahn-Hilliard modeling of metal oxide thin films for advanced CMP applications
Karagöz, Ayşe; Şengül, Yasemin; Başım, Gül Bahar (ECS, 2014)Chemical mechanical planarization (CMP) process enables topographic selectivity through formation of a protective oxide thin film on the recessed locations of the deposited metal layer, while a continuous chemical oxidation ... -
Characterization of chemically modified thin films for optimization of metal CMP applications?
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (Cambridge University Press, 2013)Metal CMP applications necessitate the formation of a protective oxide film in the presence of surface active agents, oxidizers, pH regulators and other chemicals to achieve global planarization. Formation and mechanical ... -
Chemical mechanical planarization studies on gallium nitride for improved performance
Karagöz, Ayşe; Başım, Gül Bahar; Siebert, M.; Leunissen, L. A. H. (IEEE, 2015)In this study, a systematic experimental approach has been followed to determine the conditions to promote material removal rate while controlling surface defectivity for GaN CMP. Silica based slurries were used to optimize ... -
Controlling germanium CMP selectivity through slurry mediation by surface active agents
Karagöz, Ayşe; Başım, Gül Bahar (The Electrochemical Society, 2015-08-10)New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials to semiconductor manufacturing ... -
Evaluation of infection resistance of biological implants through CMP based micro-patterning
Başım, Gül Bahar; Özdemir, Zeynep; Karagöz, Ayşe (Cambridge University Press, 2012-01)Biomaterials are widely used for dental implants, orthopedic devices, cardiac pacemakers and catheters. One of the main concerns on using bio-implants is the risk of infection on the materials used. In this study, our aim ... -
Improving selectivity on germanium CMP applications
Karagöz, Ayşe; Başım, Gül Bahar (ECS, 2014)In the presented paper, the adsorption characteristics of cationic and anionic surfactants on germanium and silica were studied in order to improve selectivity in germanium based shallow trench isolation chemical mechanical ... -
Metal oxide nano film characterization for CMP optimization
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep (ECS, 2013)This paper focuses on the planarization of metallic films in microelectronics manufacturing by CMP through investigation of metal oxide thin films forming as a result of the chemical component of the process. Tungsten ... -
Nano-boron as an antibacterial agent for functionalized textiles
Akbar, Wazir; Karagöz, Ayşe; Başım, Gül Bahar; Noor, M.; Syed, T.; Lum, J.; Unluagac, M. (Cambridge University Press, 2015-01)The antibacterial properties of boron-containing compounds are well known although there are limited studies available on the pure boron nanoparticles. In this study boron nano-particles were characterized in terms of their ... -
Nano-scale chemically modified thin film characterization for chemical mechanical planarization applications
Karagöz, Ayşe (2015-01)The aim of the microelectronics industry has historically been achieving increasing functionality through decreasing the device sizes while simultaneously reducing the unit manufacturing costs. This objective has been ... -
Photocatalytic and antibacterial functionality evaluation of nanoboron coated textiles
Akbar, Wazir; Karagöz, Ayşe; Aktas, Gözde; Başım, Gül Bahar (2016-09-01)Antibacterial properties of boron-containing compounds are well known although studies available on pure boron nanoparticles are relatively limited. In the present study, we examine the feasibility of the application of ... -
Polyethylenimine modified and non-modified polymeric micelles used for nasal administration of carvedilol
Kahraman, E.; Karagöz, Ayşe; Dinçer, S.; Özsoy, Y. (American Scientific Publishers, 2015)This study evaluates the ability of polyethylenimine-modified and non-modified polymeric micelles to enhance permeation through the nasal mucosa for a highly hydrophobic model drug. Carvedilol was loaded into polyethylen ... -
Studies on slurry design fundamentals for advanced CMP applications
Başım, Gül Bahar; Karagöz, Ayşe; Özdemir, Zeynep; Vakarelski, I. U.; Chen, L. (ECS, 2013)New developments and device performance requirements in microelectronics industry add to the challenges in chemical mechanical planarization (CMP) process. One of the recently introduced materials is germanium which enables ... -
Surfactant mediated slurry formulations for Ge CMP applications
Başım, Gül Bahar; Karagöz, Ayşe; Chen, L.; Vakarelski, I. (Cambridge University Press, 2013)In this study, slurry formulations in the presence of self-assembled surfactant structures were investigated for Ge/SiO2 CMP applications in the absence and presence of oxidizers. Both anionic (sodium dodecyl sulfate-SDS) ... -
Understanding selectivity on Germanium/SiO2 chemical mechanical planarization through design of experiments
Karagöz, Ayşe; Mal, J.; Başım, Gül Bahar (Cambridge University Press, 2015)The continuous trend of achieving more complex microelectronics with smaller nodes yet larger wafer sizes in microelectronics manufacturing lead to aggressive development requirements for chemical mechanical planarization ...
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